SEMICONDUCTOR DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which contributes to formation of a fine pattern while controlling manufacturing cost.SOLUTION: A semiconductor device manufacturing method comprises: a process of forming on a first film, a layer to be a first mask pattern by using an exposure mask on which is formed a pattern where shapes in each of which a first part projecting in a second direction orthogonal to a first direction and a second part projecting in a direction opposite to the second direction are alternately arranged in the first direction on a reference line which extends in the first direction are placed at a predetermined pitch in the second direction; and a process of forming a layer to be a second mask pattern on a second film formed below the first film.