| 摘要 |
PROBLEM TO BE SOLVED: To provide a multilayer film recessed-type reflective mask hardly causing charging during inspection/length measurement using an electron beam, suppressing deterioration of transfer accuracy caused by charging due to emission electrons in exposure and by leakage light from a side wall of a multilayer film, and capable of preventing the occurrence of mask contamination caused by erosion into the multilayer film during a cleaning process.SOLUTION: There are provided: a reflective mask which includes a conductive layer between a substrate and a multilayer film and a side wall protective film on a side wall of the recessed multilayer film, the film thickness and a sheet resistance of the conductive layer and the film thickness of the side wall protective film being within suitable ranges; and a mask blank for the reflective mask. |
