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发明名称
ETCHANT FOR REMOVING SILICON OXIDE
摘要
Disclosed is an etchant for removing silicon oxide. The etchant comprises 1-5 wt% of hydrofluoric acid, 3-10 wt% of ammonium fluoride, 0.5-3 wt% of acetate, and deionized water.
申请公布号
KR20160005639(A)
申请公布日期
2016.01.15
申请号
KR20140190742
申请日期
2014.12.26
申请人
SOULBRAIN CO., LTD.
发明人
LEE, GIL HO;PARK, JIN CHUL
分类号
C09K13/08;C03C15/00
主分类号
C09K13/08
代理机构
代理人
主权项
地址
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