| 发明名称 |
Lithographic Apparatus and to a Reflector Apparatus |
| 摘要 |
Disclosed is a reflector apparatus comprising a reflector and an array of thermoelectric heat pumps each having a first end proximal to and in thermal contact with the reflector and having a second end distal from the reflector, a lithography tool having such a reflector apparatus, and a method of using the same. |
| 申请公布号 |
US2016010901(A1) |
申请公布日期 |
2016.01.14 |
| 申请号 |
US201414773120 |
申请日期 |
2014.02.18 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
OSUMAN Andani Alhassan |
| 分类号 |
F25B21/04;G02B7/18;G03F7/20 |
主分类号 |
F25B21/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A reflector apparatus comprising:
a reflector and an array of thermoelectric heat pumps each having a first end proximal to and in thermal contact with the reflector and having a second end distal from the reflector; and a controller configured to control the thermoelectric heat pumps, whereby the controller is configured to determine a temperature of the reflector from a voltage measured across at least one of the thermoelectric heat pumps. |
| 地址 |
Veldhoven NL |
