| 发明名称 |
EXTREME ULTRAVIOLET REFLECTIVE ELEMENT WITH MULTILAYER STACK AND METHOD OF MANUFACTURING THEREOF |
| 摘要 |
An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion. |
| 申请公布号 |
US2016011502(A1) |
申请公布日期 |
2016.01.14 |
| 申请号 |
US201514696325 |
申请日期 |
2015.04.24 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
Hofmann Ralf;Hassan Vinayak Vishwanath;Beasley Cara;Foad Majeed A. |
| 分类号 |
G03F1/24;H01J37/34;H01J37/32;C23C16/44 |
主分类号 |
G03F1/24 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of manufacture for an extreme ultraviolet reflective element comprising:
providing a substrate; forming a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and forming a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion. |
| 地址 |
Santa Clara CA US |
