发明名称 EXTREME ULTRAVIOLET CAPPING LAYER AND METHOD OF MANUFACTURING AND LITHOGRAPHY THEREOF
摘要 A method of manufacture of an extreme ultraviolet reflective element includes: providing a substrate; forming a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer and a second reflective layer for forming a Bragg reflector; and forming a capping layer on and over the multilayer stack, the capping layer formed from titanium oxide, ruthenium oxide, niobium oxide, ruthenium tungsten, ruthenium molybdenum, or ruthenium niobium, and the capping layer for protecting the multilayer stack by reducing oxidation and mechanical erosion.
申请公布号 WO2016007394(A1) 申请公布日期 2016.01.14
申请号 WO2015US39158 申请日期 2015.07.03
申请人 APPLIED MATERIALS, INC. 发明人 BEASLEY, CARA;HOFMANN, RALF;FOAD, MAJEED A.;BECKSTROM III, RUDY
分类号 H01L21/027 主分类号 H01L21/027
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