发明名称 System for Electron Beam Detection
摘要 An electron beam detection apparatus includes a first aperture element including a first set of apertures. The apparatus includes a second aperture element including a second set of apertures. The second set of apertures is arranged in a pattern corresponding with the pattern of the first plurality of apertures. The detection apparatus includes an electron-photon conversion element configured to receive electrons of the electron beam transmitted through the first and second aperture elements. The electron-photon conversion element is configured to generate photons in response to the received electrons. The detection apparatus includes an optical assembly including one or more optical elements. The detection apparatus includes a detector assembly. The optical elements of the optical assembly are configured to direct the generated photons from the electron-photon conversion system to the detector assembly.
申请公布号 US2016011110(A1) 申请公布日期 2016.01.14
申请号 US201514686308 申请日期 2015.04.14
申请人 KLA-Tencor Corporation 发明人 Kojima Shinichi;Wahba Hamada;Gluszczak Michael R.;DiRegolo Joseph A.
分类号 G01N21/64;H01J37/22;H01J37/244 主分类号 G01N21/64
代理机构 代理人
主权项 1. An apparatus for electron beam detection comprising: a first aperture element including a first plurality of apertures; a second aperture element including a second plurality of apertures, the second plurality of apertures arranged in a pattern corresponding with the pattern of the first plurality of apertures; a scintillator element configured to receive electrons of the patterned electron beam transmitted through the first aperture element and the second aperture element, wherein the scintillator element is configured to generate light in response to the received electrons; an optical guide assembly; and a light detector configured to measure a light signal from the scintillator element, wherein the optical guide assembly is configured to direct light generated by the scintillator element to the light detector.
地址 Milpitas CA US