VAPOR DEPOSITION UNIT AND VAPOR DEPOSITION DEVICE

摘要

A vapor deposition unit includes: a vapor deposition source; a plurality of limiting plate units provided so as to constitute respective of a plurality of stages, the plurality of limiting plate units including at least a first limiting plate unit and a second limiting plate unit; and a vapor deposition mask which are provided in this order, the first limiting plate unit including a plurality of first limiting plates, the second limiting plate unit including a plurality of second limiting plates, and when viewed in a Z axis direction, the second limiting plates extending in a direction intersecting with a Y axis direction.

主权项

1. A vapor deposition unit comprising:
a vapor deposition mask; a vapor deposition source for injecting vapor deposition particles toward the vapor deposition mask; and a plurality of limiting plate units provided so as to constitute respective of a plurality of stages, the plurality of limiting plate units including at least a first limiting plate unit and a second limiting plate unit, and the plurality of limiting plate units being provided between the vapor deposition mask and the vapor deposition source and limiting angles at which the vapor deposition particles pass through the plurality of limiting plate units, the first limiting plate unit including a first limiting plate row of a plurality of first limiting plates which, when viewed in a direction perpendicular to a principal surface of the vapor deposition mask, are provided so as to be spaced from each other in a first direction and be parallel to each other, the second limiting plate unit being provided between the first limiting plate unit and the vapor deposition mask and including a plurality of second limiting plates, and when viewed in the direction perpendicular to the principal surface of the vapor deposition mask, the plurality of second limiting plates extending in a direction intersecting with a second direction perpendicular to the first direction.