| 摘要 |
Provided are an actinic ray-sensitive or radiation-sensitive resin composition having a large depth of focus and excellent line width roughness, a pattern-forming method using said composition, and an electronic device production method. The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin (P) containing: a repeat unit (a) that comprises at least a specific repeat unit (a1) represented by general formula (1), and that has a group that is decomposed by the action of an acid to generate a polar group; a repeat unit (b1) that has at least a lactone structure, a sultone structure or a carbonate structure; a repeat unit (b2) that is different to the repeat unit (b1) and that has at least a lactone structure, a sultone structure or a carbonate structure. The Ohnishi parameter of the repeat unit (b1) is larger that the Ohnishi parameter of the repeat unit (b2), and the difference between both is at least 0.85. |
