发明名称 FILM FORMATION MASK, METHOD FOR PRODUCING FILM FORMATION MASK, AND TOUCH PANEL
摘要 The present invention is provided with: a mask layer (1) having an opening pattern (4) identical in shape and size to a transparent electrode and corresponding to the transparent electrode, which is formed as a film on the surface of a display panel (5); and a support layer (2) having a plurality of support lines (2a) provided to one surface (1a) of the mask layer (1) traversing the opening pattern (4). The arraying pitch of the support lines (2a) of the support layer (2) has dimensions able to suppress the occurrence of diffraction fringes or moiré fringes stemming from the shadows of the support lines (2a) transferred onto the transparent electrode as film thickness unevenness.
申请公布号 WO2016006480(A1) 申请公布日期 2016.01.14
申请号 WO2015JP68514 申请日期 2015.06.26
申请人 V TECHNOLOGY CO., LTD. 发明人 MIZUMURA, MICHINOBU;KUDO, SHUJI;KAJIYAMA, KOICHI
分类号 C23C14/04;G06F3/041 主分类号 C23C14/04
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