发明名称 SOLID-STATE IMAGE SENSOR
摘要 A solid-state image sensor is provided. The solid-state image sensor includes a substrate. The substrate includes an electrode layer, an insulating layer arranged on the electrode layer, and a semiconductor layer arranged on the insulating layer. The semiconductor layer includes a first semiconductor region of a first conductivity type, a second semiconductor region configured to accumulate charges generated by photoelectric conversion, the second semiconductor region being arranged on the first semiconductor region and having a second conductivity type opposite to the first conductivity type, and a third semiconductor region of the second conductivity type to which the charges accumulated in the second semiconductor region are transferred.
申请公布号 US2016014352(A1) 申请公布日期 2016.01.14
申请号 US201514751653 申请日期 2015.06.26
申请人 CANON KABUSHIKI KAISHA 发明人 Moriyama Takashi;Sakaguchi Kiyofumi
分类号 H04N5/335;H01L27/146 主分类号 H04N5/335
代理机构 代理人
主权项 1. A solid-state image sensor comprising a substrate, the substrate including an electrode layer, an insulating layer arranged on the electrode layer, and a semiconductor layer arranged on the insulating layer, wherein the semiconductor layer includes: a first semiconductor region of a first conductivity type; a second semiconductor region configured to accumulate charges generated by photoelectric conversion, the second semiconductor region being arranged on the first semiconductor region and having a second conductivity type opposite to the first conductivity type; and a third semiconductor region of the second conductivity type to which the charges accumulated in the second semiconductor region are transferred.
地址 Tokyo JP