发明名称 |
SOLID-STATE IMAGE SENSOR |
摘要 |
A solid-state image sensor is provided. The solid-state image sensor includes a substrate. The substrate includes an electrode layer, an insulating layer arranged on the electrode layer, and a semiconductor layer arranged on the insulating layer. The semiconductor layer includes a first semiconductor region of a first conductivity type, a second semiconductor region configured to accumulate charges generated by photoelectric conversion, the second semiconductor region being arranged on the first semiconductor region and having a second conductivity type opposite to the first conductivity type, and a third semiconductor region of the second conductivity type to which the charges accumulated in the second semiconductor region are transferred. |
申请公布号 |
US2016014352(A1) |
申请公布日期 |
2016.01.14 |
申请号 |
US201514751653 |
申请日期 |
2015.06.26 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Moriyama Takashi;Sakaguchi Kiyofumi |
分类号 |
H04N5/335;H01L27/146 |
主分类号 |
H04N5/335 |
代理机构 |
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代理人 |
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主权项 |
1. A solid-state image sensor comprising a substrate,
the substrate including an electrode layer, an insulating layer arranged on the electrode layer, and a semiconductor layer arranged on the insulating layer, wherein the semiconductor layer includes: a first semiconductor region of a first conductivity type; a second semiconductor region configured to accumulate charges generated by photoelectric conversion, the second semiconductor region being arranged on the first semiconductor region and having a second conductivity type opposite to the first conductivity type; and a third semiconductor region of the second conductivity type to which the charges accumulated in the second semiconductor region are transferred. |
地址 |
Tokyo JP |