主权项 |
1. A non-volatile memory with a single gate-source common terminal, comprising
a semiconductor substrate; a transistor including a first dielectric layer, a first electric-conduction gate and a plurality of first ion-doped regions, wherein said first dielectric layer is disposed on said semiconductor substrate, and wherein said first electric-conduction gate is stacked on said first dielectric layer, and wherein said first ion-doped regions are respectively disposed at two sidessides of said first electric-conduction gate to function as a source and a drain; and a capacitor structure including a second dielectric layer, a second ion-doped region and a second electric-conduction gate, wherein said second dielectric layer is disposed on said semiconductor substrate, and wherein said second electric-conduction gate is stacked on said second dielectric layer, and wherein said second ion-doped region and said first ion-doped regions are doped with an identical type of ions, and wherein said second ion-doped region is only disposed at one side of said second dielectric layer, and wherein a channel is formed below said second dielectric layer, and wherein said first electric-conduction gate and said second electric-conduction gate are electrically connected to form a single floating gate, and wherein said source and said second ion-doped region are electrically connected to form a single gate-source common terminal. |