METHODS FOR DESIGNING PHOTONIC DEVICES

摘要

A compact, low-loss and wavelength insensitive Y-junction for submicron silicon waveguides. The design was performed using FDTD and particle swarm optimization (PSO). The device was fabricated in a 248 nm CMOS line. Measured average insertion loss is 0.28±0.02 dB across an 8-inch wafer. The device footprint is less than 1.2 μm×2 μm, orders of magnitude smaller than MMI and directional couplers.

主权项

1. A method of designing a photonic device, the method comprising:
identifying fabrication design rules of a fabrication process; generating an initial device design by determining, with use of constraints of the fabrication design rules, a plurality of I/O ports and segments along a direction of optical signal propagation, each segment of the plurality of segments characterized by at least one width, at least one of the segments characterized by at least two widths; and iteratively optimizing a device design starting with the initial device design by:
generating a smoothed geometry of the device design;simulating a functionality of the device utilizing the smoothed geometry of the device design; andutilizing an optimization algorithm on said widths characterizing said segments.