MEMS PRESSURE SENSOR WITH THERMAL COMPENSATION

摘要

A semiconductor device having a capacitive pressure sensor structure includes a substrate, an interlayer dielectric layer on the substrate, a bottom electrode of a pressure sensor within the interlayer dielectric layer, a pressure sensing cavity above the bottom electrode, a sensing film above the pressure sensing cavity and covering a portion of the interlayer dielectric layer, a cover layer on the interlayer dielectric layer and on the sensing film, the cover layer having an opening exposing a portion of the sensing film, and a high thermal expansion coefficient material layer disposed on cover layer and sidewalls of the opening. Through the use of the high thermal expansion coefficient material layer, the capacitive pressure sensor structure is not susceptible to changes in ambient temperature to enhance the sensitivity of the capacitive pressure sensor structure.

主权项

1. A semiconductor device comprising:
a substrate; an interlayer dielectric layer on the substrate; a bottom electrode of a pressure sensor within the interlayer dielectric layer; a pressure sensing cavity above the bottom electrode; a sensing film above the pressure sensing cavity and covering a portion of the interlayer dielectric layer; a cover layer on the interlayer dielectric layer and on the sensing film, the cover layer having an opening exposing a portion of the sensing film; a high thermal expansion coefficient material layer disposed on cover layer and sidewalls of the opening.