发明名称 MEMS Device Structure and Methods of Forming Same
摘要 A microelectromechanical system (MEMS) device may include a MEMS structure above a first substrate. The MEMS structure comprising a central static element, a movable element, and an outer static element. A portion of bonding material between the central static element and the first substrate. A second substrate above the MEMS structure, with a portion of a dielectric layer between the central static element and the second substrate. A supporting post comprises the portion of bonding material, the central static element, and the portion of dielectric material.
申请公布号 US2016009551(A1) 申请公布日期 2016.01.14
申请号 US201514860505 申请日期 2015.09.21
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Chang Chang-Chia;Fan Chen-Chih;Chou Bruce C.S.
分类号 B81C1/00;B81B7/00 主分类号 B81C1/00
代理机构 代理人
主权项 1. A method for forming a microelectromechanical system (MEMS) device comprising: forming a MEMS structure over a first substrate, wherein the MEMS structure comprises a movable element and a static element; forming an interconnect structure on a second substrate; depositing a first dielectric layer on the interconnect structure; and bonding the MEMS structure to the first dielectric layer, the bonding forming a cavity surrounding the movable element, the static element forming at least part of a first supporting post in the cavity, the first supporting post configured to support the second substrate.
地址 Hsin-Chu TW