发明名称 |
MEMS Device Structure and Methods of Forming Same |
摘要 |
A microelectromechanical system (MEMS) device may include a MEMS structure above a first substrate. The MEMS structure comprising a central static element, a movable element, and an outer static element. A portion of bonding material between the central static element and the first substrate. A second substrate above the MEMS structure, with a portion of a dielectric layer between the central static element and the second substrate. A supporting post comprises the portion of bonding material, the central static element, and the portion of dielectric material. |
申请公布号 |
US2016009551(A1) |
申请公布日期 |
2016.01.14 |
申请号 |
US201514860505 |
申请日期 |
2015.09.21 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Chang Chang-Chia;Fan Chen-Chih;Chou Bruce C.S. |
分类号 |
B81C1/00;B81B7/00 |
主分类号 |
B81C1/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method for forming a microelectromechanical system (MEMS) device comprising:
forming a MEMS structure over a first substrate, wherein the MEMS structure comprises a movable element and a static element; forming an interconnect structure on a second substrate; depositing a first dielectric layer on the interconnect structure; and bonding the MEMS structure to the first dielectric layer, the bonding forming a cavity surrounding the movable element, the static element forming at least part of a first supporting post in the cavity, the first supporting post configured to support the second substrate. |
地址 |
Hsin-Chu TW |