发明名称 SEMICONDUCTOR DEVICE PRODUCTION METHOD, SHEET-SHAPED RESIN COMPOSITION, DICING TAPE-INTEGRATED SHEET-SHAPED RESIN COMPOSITION
摘要 A production method for a semiconductor device is provided whereby, when peeling a support body from an attached wafer, melting of a sheet-shaped resin composition pasted to the other surface of the wafer can be suppressed. The method comprises: preparing a support body-attached wafer, said support body-attached wafer having the support body bonded, via a temporary fixing layer, to one surface of the wafer having a through electrode formed therein; preparing a dicing tape-integrated sheet-shaped resin composition having a sheet-shaped resin composition having an external shape smaller than the other surface of the wafer formed upon a dicing tape; pasting the other surface of the support body-attached wafer to the sheet-shaped resin composition in the dicing tape-integrated sheet-shaped resin composition; and melting the temporary fixing layer by a solvent and peeling the support body away from the wafer.
申请公布号 US2016013089(A1) 申请公布日期 2016.01.14
申请号 US201414772724 申请日期 2014.02.28
申请人 NITTO DENKO CORPORATION 发明人 Takamoto Naohide;Morita Kosuke;Fukui Akihiro;Hanazono Hiroyuki;Suzuki Akira
分类号 H01L21/683;B32B27/08;C08J5/18;H01L21/78 主分类号 H01L21/683
代理机构 代理人
主权项 1. A semiconductor device production method, comprising: a step A of preparing a wafer with a support including a wafer, a temporary fixing layer, and a support bonded to one side of the wafer, on which a through electrode is formed, with the temporary fixing layer interposed therebetween, a step B of preparing a dicing tape-integrated sheet-shaped resin composition including a dicing tape and a sheet-shaped resin composition smaller in an outer shape than the other side of the wafer formed on the dicing tape, a step C of pasting the other side of the wafer with a support to the sheet-shaped resin composition of the dicing tape-integrated sheet-shaped resin composition, and a step D of dissolving the temporary fixing layer with a solvent to peel the support from the wafer.
地址 Ibaraki-shi, Osaka JP