| 摘要 |
The present invention relates to a contact cleaning device of a large area substrate. The contact cleaning device of the large area substrate comprises: an upper cleaning unit (1) to clean the upper side of a substrate (S) in a contact manner by including a plurality of disk brush units (100) arranged in a width direction of the substrate (S) being transferred; and a lower cleaning unit (2) to clean the lower side of the substrate (S) in a contact manner by including a plurality of disk brush units located on the lower side of each of the disk brush units, as placed on the lower side of the upper cleaning unit (1). The disk brush unit comprises: a base plate (110); a cylindrical support unit (120) inserted and fixated into a hole plated on a part of the base plate (110); a cylindrical rotary body unit (130) combined to the inside of the support unit (120) to be rotated by a bearing (121); a spring (170) inserted into the rotary body unit (130); a vertical movement axis (160) of which a part is inserted into the rotary body unit (130), and a part is exposed so that a disk brush (150) is fixated to an end of the exposed part; and a lower body unit (140) to cover the lower side of the rotary body unit (130), to expose one side of the vertical movement axis (160) combined with the disk brush (150), and to fixate the vertical movement axis (160) by combining a fixing bolt (141) to a lateral side thereof. |
