发明名称 STRUCTURE AND METHOD FOR PROTECTING STRESS-SENSITIVE INTEGRATED CIRCUIT
摘要 Methods and apparatuses, wherein the method includes reducing stacking stress. The method couples a first die to a compliant layer. The method couples a second die to the compliant layer, wherein the compliant layer at least partially covers a portion of an interface between the first die and the second die, and wherein the compliant layer is formed in a trench in the second die.
申请公布号 US2016013136(A1) 申请公布日期 2016.01.14
申请号 US201414329883 申请日期 2014.07.11
申请人 QUALCOMM Incorporated 发明人 RAMACHANDRAN Vidhya;BAO Zhongping
分类号 H01L23/00;H01L25/00;H01L23/31;H01L25/065 主分类号 H01L23/00
代理机构 代理人
主权项 1. An apparatus comprising: a first die; a second die; and a compliant layer coupled to the first die and the second die, wherein the compliant layer at least partially covers a portion of an interface between the first die and the second die, and wherein the compliant layer is formed in a trench in the second die.
地址 San Diego CA US