发明名称 |
DISPLAY DEVICE FOR TRANSPARENT GLAZING |
摘要 |
Device for displaying a real image on a glazing unit of a passenger compartment or a facade, said glazing unit comprising on its face exposed to said source a coating that prevents reflection of incident monochromatic laser radiation emitted by a source scanning a portion of said glazing unit, said stack consisting of a stack of two layers, namely, starting from the glazing function substrate, a first layer made of a material based on zinc oxide, tin oxide, silicon nitride, a zinc tin oxide or a zirconium silicon oxide; and a second layer made of a material based on a silicon oxide, in which the respective geometric thicknesses Ep1 and Ep2 of said layers are substantially equal to:
for the first layer:;Ep1=26+0.07(θ)−0.007(θ)2 (1)for the second layer:;Ep2=83−0.1(θ)+0.01(θ)2 (2),;in which θ is the mean angle of orientation of the incident monochromatic laser radiation to the normal to said glazing unit, in the scanned portion of the glazing unit. |
申请公布号 |
US2016011414(A1) |
申请公布日期 |
2016.01.14 |
申请号 |
US201414771978 |
申请日期 |
2014.02.27 |
申请人 |
SAINT-GOBAIN GLASS FRANCE |
发明人 |
Joseph Camille |
分类号 |
G02B27/00;G02B1/115;G02B27/01;B32B17/10 |
主分类号 |
G02B27/00 |
代理机构 |
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代理人 |
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主权项 |
1. A device for displaying a real image on a glazing unit, said device comprising:
a source of monochromatic, transverse magnetic polarized laser radiation of wavelength between 380 and 410 nm; and said glazing unit, at least one portion of which comprises a luminophore that absorbs said radiation in order to reemit light in the visible range and thereby display the image, wherein: said source of radiation is oriented toward a portion of said glazing unit in order to scan said portion so as to make a mean angle θ to the normal to said glazing unit; said glazing unit is equipped on its face exposed to said source with an antireflection coating comprising a stack of two layers comprising, starting from a glazing function substrate:
a first layer comprising a material comprising zinc oxide, tin oxide, silicon nitride, a zinc tin oxide or a zirconium silicon oxide, said first layer having a thickness Ep1; anda second layer comprising a material comprising silicon oxide, and optionally furthermore comprising at least one of carbon, nitrogen, and aluminum, said second layer having a thickness Ep2; and respective geometric thicknesses Ep1 and Ep2 of said layers are substantially equal to:
for the first layer:
Ep1=26+0.07(θ)−0.007(θ)2 (1) for the second layer:
Ep2=83−0.1(θ)+0.01(θ)2 (2). |
地址 |
Courbevoie FR |