发明名称 露光装置及び露光済み材製造方法
摘要 <p>The relative position of an exposure mask and an exposure target material is more accurately specified without using a complex, expensive mechanism. In addition, delays in the work time using a light exposure device are eliminated. A light exposure device is provided with an imaging unit that images at least a part of a first positioning mark and a second positioning mark formed on an exposure mask through a microlens array, and when the imaging ends, moves in the specified direction so that the exposure light to the exposure target is not obstructed when the second position mark is imaged; a positioning controller for positioning the exposure target material and the exposure mask based on the position information of the first and second positioning marks; and an exposure start timing controller for starting the illumination of exposure light from the light source before the motion of the imaging unit ends.</p>
申请公布号 JP5842251(B2) 申请公布日期 2016.01.13
申请号 JP20120001454 申请日期 2012.01.06
申请人 株式会社ブイ・テクノロジー 发明人 橋本 和重
分类号 G03F7/20;G03F9/00 主分类号 G03F7/20
代理机构 代理人
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