发明名称 p型拡散層の製造方法、及び太陽電池素子の製造方法
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for forming a p-type diffusion layer and a manufacturing method of a solar cell element, capable of suppressing warpage of a substrate and generating little residue derived from a dispersion medium in a manufacturing process of a solar cell element using a silicon substrate. <P>SOLUTION: A p-type diffusion layer is formed on a silicon substrate by using a p-type diffusion layer forming composition containing dispersion media and glass powders containing acceptor elements and ultrasonic cleaning is carried out. <P>COPYRIGHT: (C)2013,JPO&INPIT</p>
申请公布号 JP5842432(B2) 申请公布日期 2016.01.13
申请号 JP20110161316 申请日期 2011.07.22
申请人 日立化成株式会社 发明人 佐藤 鉄也;吉田 誠人;野尻 剛;町井 洋一;岩室 光則;織田 明博;足立 修一郎
分类号 H01L21/225;H01L31/04 主分类号 H01L21/225
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