发明名称 |
Method of patterning a thin film layer using phase-change materials |
摘要 |
A method and system for masking a surface to be etched is described. A droplet source ejects droplets of a masking material for deposit on a thin-film or other substrate surface to be etched. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze upon contact with the thin-film or substrate surface. The thin-film or substrate is then etched. After etching the masking material is removed. |
申请公布号 |
EP1251398(B1) |
申请公布日期 |
2016.01.13 |
申请号 |
EP20020008866 |
申请日期 |
2002.04.19 |
申请人 |
XEROX CORPORATION |
发明人 |
WONG, WILLIAM S.;STREET, ROBERT A.;WHITE, STEPHEN D.;MATUSIAK, ROBERT;APTE, RAJ B. |
分类号 |
B41M5/00;C23F1/00;B41M3/00;G02F1/1368;G03F1/00;G03F7/20;H01L21/033;H01L21/308;H01L27/12 |
主分类号 |
B41M5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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