| 摘要 |
<p>The present invention provides a gas supply head which has high gas supply uniformity and can restrain unnecessary deposit in a non-planned area. The gas supply head is provided with the following components: a first gas array (102a) which is composed of a plurality of gas discharging holes; a second gas array (102b) which is composed of a plurality of other gas discharging holes that are configured parallelly with the first gas array (102a) in a surface same to the first gas array (102a); one or more than two gas diffusion chambers (101a) which are only communicated with the gas discharging holes which form the first gas array (102a) through gas flow paths; and one or more than two gas diffusion chambers (101b) which are only communicated with the gas discharging holes that form the second gas array (102b) through gas flow paths. Different kinds of gas are supplied for the first gas diffusion chambers (101a) and the second gas diffusion chambers (102b).</p> |
