发明名称 MULTILAYER STRUCTURE, MULTILAYER STRUCTURE MANUFACTURING METHOD AND COMPOSITION SET
摘要 The object of the present invention is to provide a multilayer structure that does not require calcining at high temperature and large-scale equipment for production, that has low production cost and, furthermore, that has performance characteristics with respect to tiles such as for example surface hardness and excellent impact resistance and durability (surface hardness and impact resistance being unimpaired for a long period of time and there being no discoloration). Moreover, there can be provided a process for producing the multilayer structure and a composition set for producing the multilayer structure. Disclosed is a multilayer structure comprising, in sequence, (Layer 1) a substrate layer, (Layer 2) an image layer containing a colored pigment, and (Layer 3) a protective layer formed by a condensation reaction of an organosilicon compound.
申请公布号 EP2965904(A1) 申请公布日期 2016.01.13
申请号 EP20140761106 申请日期 2014.03.07
申请人 FUJIFILM CORPORATION 发明人 UMEBAYASHI TSUTOMU
分类号 B32B27/00;B41M1/12;B41M1/34;B41M5/00;B41M7/00;C09D11/00 主分类号 B32B27/00
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