| 发明名称 | Reflective mask and method for manufacturing the same | ||
| 摘要 | A reflective mask includes a substrate and a multilayer reflective film formed on the substrate. An absorption pattern is formed on the multilayer reflective film. A recess is formed in the multilayer reflective film in a peripheral region of the absorption pattern. | ||
| 申请公布号 | US9235114(B2) | 申请公布日期 | 2016.01.12 |
| 申请号 | US201314066398 | 申请日期 | 2013.10.29 |
| 申请人 | FUJITSU SEMICONDUCTOR LIMITED | 发明人 | Kagawa Takeshi |
| 分类号 | G03F1/24;G03F1/22 | 主分类号 | G03F1/24 |
| 代理机构 | Westerman, Hattori, Daniels & Adrian, LLP | 代理人 | Westerman, Hattori, Daniels & Adrian, LLP |
| 主权项 | 1. A reflective mask comprising: a substrate; a multilayer reflective film formed on the substrate; an absorption pattern formed on the multilayer reflective film; an exposed surface portion of the multilayer reflective film formed in a peripheral region of the absorption pattern; and a recess formed in the multilayer reflective film in the peripheral region of the absorption pattern. | ||
| 地址 | Yokohama-shi JP | ||