发明名称 |
Oxide semiconductor device including photodiode |
摘要 |
A solid-state image sensing element including a transistor with stable electrical characteristics (e.g., significantly low off-state current) is provided. Two different element layers (an element layer including an oxide semiconductor layer and an element layer including a photodiode) are stacked over a semiconductor substrate provided with a driver circuit such as an amplifier circuit, so that the area occupied by a photodiode is secured. A transistor including an oxide semiconductor layer in a channel formation region is used as a transistor electrically connected to the photodiode, which leads to lower power consumption of a semiconductor device. |
申请公布号 |
US9236408(B2) |
申请公布日期 |
2016.01.12 |
申请号 |
US201313864465 |
申请日期 |
2013.04.17 |
申请人 |
Semiconductor Energy Laboratory Co., Ltd. |
发明人 |
Yamazaki Shunpei |
分类号 |
H01L31/062;H01L27/146 |
主分类号 |
H01L31/062 |
代理机构 |
Nixon Peabody LLP |
代理人 |
Nixon Peabody LLP ;Costellia Jeffrey L. |
主权项 |
1. A semiconductor device comprising:
a driver circuit comprising a first transistor comprising a first channel formation region, the first transistor being provided on a top surface of a semiconductor substrate; a second transistor comprising an oxide semiconductor layer including indium in a second channel formation region over the first transistor; and a photodiode over the second transistor, the photodiode being electrically connected to the second transistor, wherein a gate electrode layer of the second transistor overlaps a gate electrode layer of the first transistor when seen from a direction perpendicular to the top surface of the semiconductor substrate. |
地址 |
Kanagawa-ken JP |