发明名称 Coil parts and method of manufacturing the same
摘要 The present invention discloses a coil part including: a lower magnetic body; primary and secondary lower patterns formed on the lower magnetic body in a spiral shape in parallel to each other; a lower insulating layer covering the primary and secondary lower patterns; primary and secondary upper patterns electrically connected to the primary and secondary lower patterns, respectively, and formed on the lower insulating layer in a spiral shape in parallel to each other to correspond to the primary and secondary lower patterns; and an upper magnetic body formed on the primary and secondary upper patterns, wherein the primary and secondary upper patterns have portions which cross the primary and secondary lower patterns on the plane, and a method of manufacturing the same.
申请公布号 US9236173(B2) 申请公布日期 2016.01.12
申请号 US201213707526 申请日期 2012.12.06
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 Yoo Young Seuck;Ahn Young Ghyu;Kim Yong Suk;Lee Sang Moon;Kwak Jeong Bok;Hur Kang Heon;Wi Sung Kwon
分类号 H01F5/00;H01F27/28;H01F41/04;H01F19/04;H01F17/00 主分类号 H01F5/00
代理机构 McDermott Will & Emery LLP 代理人 McDermott Will & Emery LLP
主权项 1. A coil part comprising: a lower magnetic body; primary and secondary lower patterns formed on the lower magnetic body in a spiral shape in parallel to each other; a lower insulating layer covering the primary and secondary lower patterns; primary and secondary upper patterns electrically connected to the primary and secondary lower patterns, respectively, and formed on the lower insulating layer in a spiral shape in parallel to each other to correspond to the primary and secondary lower patterns; and an upper magnetic body formed on the primary and secondary upper patterns, wherein the primary and secondary upper patterns have portions which cross the primary and secondary lower patterns on the plane, wherein the primary and secondary upper patterns are arranged to cross arrangement of the primary and secondary lower patterns, and wherein the primary upper pattern is arranged to be positioned in a space between the primary lower pattern and the secondary lower pattern, and the secondary upper pattern is arranged to be positioned in a space between the primary lower pattern and the secondary lower pattern in the crossing portions.
地址 Suwon-Si, Gyeonggi-Do KR
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