| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold for an imprint and an imprint device, capable of forming a pattern in a plurality of regions of a transfer object at a high throughput while maintaining accuracy of pattern formation.SOLUTION: A mold 11 for an imprint is made to have a base material 13, a plurality of rectangle unit transfer regions 12A, 12B, 12C, 12D which are arranged in a lattice shape on one surface 13a of the base material 13, and transfer pattern parts 15 which are located in these unit transfer regions 12A, 12B, 12C, 12D, respectively. Rectangle sides are made to be separated from each other among the unit transfer regions 12A, 12B, 12C, 12D. |
