发明名称 |
Programmable gate III-nitride power transistor |
摘要 |
A III-nitride semiconductor device which includes a charged floating gate electrode. |
申请公布号 |
US9236462(B2) |
申请公布日期 |
2016.01.12 |
申请号 |
US201113334720 |
申请日期 |
2011.12.22 |
申请人 |
Infineon Technologies Americas Corp. |
发明人 |
Briere Michael A. |
分类号 |
H01L29/778;H01L29/66;H01L29/80;H01L29/423;H01L29/772;H01L29/20;H01L29/51 |
主分类号 |
H01L29/778 |
代理机构 |
Farjami & Farjami LLP |
代理人 |
Farjami & Farjami LLP |
主权项 |
1. A programmable III-Nitride power transistor comprising:
a first III-nitride semiconductor body; a second III-nitride semiconductor body situated over said first III-nitride semiconductor body to form a two dimensional electron gas; a passivation layer situated over said second III-nitride semiconductor body; a gate arrangement disposed over said second III-nitride semiconductor body, said gate arrangement including a non-volatile floating gate situated in a trench within said passivation layer, and a gate electrode situated over said non-volatile floating gate and electrically insulated from said non-volatile floating gate by an insulation spacer in said trench, said non-volatile floating gate configured for programming said III-Nitride power transistor by a current produced in said two dimensional electron gas. |
地址 |
El Segundo CA US |