发明名称 Programmable gate III-nitride power transistor
摘要 A III-nitride semiconductor device which includes a charged floating gate electrode.
申请公布号 US9236462(B2) 申请公布日期 2016.01.12
申请号 US201113334720 申请日期 2011.12.22
申请人 Infineon Technologies Americas Corp. 发明人 Briere Michael A.
分类号 H01L29/778;H01L29/66;H01L29/80;H01L29/423;H01L29/772;H01L29/20;H01L29/51 主分类号 H01L29/778
代理机构 Farjami & Farjami LLP 代理人 Farjami & Farjami LLP
主权项 1. A programmable III-Nitride power transistor comprising: a first III-nitride semiconductor body; a second III-nitride semiconductor body situated over said first III-nitride semiconductor body to form a two dimensional electron gas; a passivation layer situated over said second III-nitride semiconductor body; a gate arrangement disposed over said second III-nitride semiconductor body, said gate arrangement including a non-volatile floating gate situated in a trench within said passivation layer, and a gate electrode situated over said non-volatile floating gate and electrically insulated from said non-volatile floating gate by an insulation spacer in said trench, said non-volatile floating gate configured for programming said III-Nitride power transistor by a current produced in said two dimensional electron gas.
地址 El Segundo CA US