| 摘要 |
PROBLEM TO BE SOLVED: To provide a template including a fine uneven pattern and a large uneven pattern and capable of filling the large uneven pattern with a resist in a short time when forming a pattern using the template.SOLUTION: According to an embodiment, there is provided a template 10 comprising a first pattern, a second pattern, and a first dummy pattern. The first pattern is arranged with an uneven pattern having a width not more than 100 nm. The second pattern is arranged with an uneven pattern having a wider width than 100 nm. The first dummy pattern is arranged in a bottom of a concave pattern of the second pattern, and lower than the height of the uneven pattern. The first dummy pattern is also arranged so that the interval between the first dummy pattern and other patterns adjacent to the first dummy pattern becomes less than or equal to 100 nm. |
