发明名称 Method of manufacturing multi-layer wiring board
摘要 Embodiments of the presently-disclosed subject matter include a first laminated structure in which at least one conductor layer and at least one resin insulating layer are alternately formed is formed on a supporting substrate, and a core substrate is formed so as to come into contact with the conductor layer which is the uppermost layer of the first laminated structure. Then, laser light is emitted to the core substrate to form a through hole and a metal layer is formed in the through hole. Then, a second laminated structure including at least one conductor layer and at least one resin insulating layer is formed on the core substrate. At that time, the thickness of the conductor layer which is the uppermost layer of the first laminated structure is greater than that of the other conductor layers.
申请公布号 US9237656(B2) 申请公布日期 2016.01.12
申请号 US201213721556 申请日期 2012.12.20
申请人 NGK SPARK PLUG CO., LTD. 发明人 Maeda Shinnosuke;Suzuki Tetsuo;Hando Takuya;Sugimoto Atsuhiko;Hirano Satoshi;Saiki Hajime
分类号 H05K3/10;H05K3/46;H05K3/00 主分类号 H05K3/10
代理机构 Stites & Harbison, PLLC 代理人 Stites & Harbison, PLLC ;Haeberlin Jeffrey A.;Hayne James R.
主权项 1. A method of manufacturing a multi-layer wiring board, comprising: forming, on a supporting substrate, a first laminated structure in which at least one conductor layer and at least one resin insulating layer are alternately formed; forming a core substrate on the first laminated structure so as to come into contact with a conductor layer which is an uppermost layer of the first laminated structure; forming a through hole in the core substrate on which a metal layer is provided on its upper main surface by emitting laser light to the core substrate; removing a portion of the metal layer which is disposed immediately above a portion of the core substrate in which the through hole will be formed before the laser light is emitted to the core substrate; forming a through hole metal layer on at least an inner circumferential surface of the through hole; forming a second laminated structure in which at least one conductor layer and at least one resin insulating layer are alternately formed on the core substrate having the through hole metal layer formed thereon; and removing the supporting substrate from the first laminate structure, wherein a thickness of the conductor layer which is the uppermost layer of the first laminated structure is greater than a thickness of other conductor layers.
地址 Nagoya JP