发明名称 Field effect transistor devices
摘要 A memcapacitor device includes a pair of opposing conductive electrodes. A semiconductive material including mobile dopants within a dielectric and a mobile dopant barrier dielectric material are received between the pair of opposing conductive electrodes. The semiconductive material and the barrier dielectric material are of different composition relative one another which is at least characterized by at least one different atomic element. One of the semiconductive material and the barrier dielectric material is closer to one of the pair of electrodes than is the other of the semiconductive material and the barrier dielectric material. The other of the semiconductive material and the barrier dielectric material is closer to the other of the pair of electrodes than is the one of the semiconductive material and the barrier dielectric material. Other implementations are disclosed, including field effect transistors, memory arrays, and methods.
申请公布号 US9236473(B2) 申请公布日期 2016.01.12
申请号 US201414277134 申请日期 2014.05.14
申请人 Micron Technology, Inc. 发明人 Meade Roy E.;Sandhu Gurtej S.
分类号 G11C11/22;H01L29/78;G11C11/56;G11C13/00;H01L21/28;H01L49/02;H01L29/792;H01L27/06 主分类号 G11C11/22
代理机构 Wells St. John, P.S. 代理人 Wells St. John, P.S.
主权项 1. A field effect transistor device capable of being repeatedly programmed to at least two different static threshold voltage states, comprising: a pair of source/drain regions, a channel region between the pair of source/drain regions, and a gate construction operably proximate the channel region; and the gate construction comprising a conductive gate electrode and comprising a semiconductive material comprising mobile dopants within a dielectric and comprising a mobile dopant barrier dielectric material received between the conductive gate electrode and the channel region, the mobile dopant barrier dielectric material being closer to the channel region than to the conductive gate electrode, the semiconductive material that comprises mobile dopants within a dielectric being closer to the conductive gate electrode than to the channel region, the mobile dopant barrier dielectric material comprising at least one of ZrO2, SiO2, Si3N4, GeN, and SrTiO3.
地址 Boise ID US