发明名称 | Liquid crystal display device and manufacturing method thereof | ||
摘要 | A liquid crystal display device includes a gate electrode; a gate insulating layer on the gate electrode; an active layer on the gate insulating layer corresponding to the gate electrode; source and drain electrodes on the active layer; a first passivation layer on the source and drain electrodes; a common electrode on the first passivation layer; a second passivation layer on the common electrode, covering the common electrode, and having a separate region from the first passivation layer at a thickness of the common electrode; a pixel electrode on the second passivation layer and connected to the drain electrode through a drain contact hole; and a common line at a same layer as the pixel electrode and connected to the common electrode. | ||
申请公布号 | US9236399(B1) | 申请公布日期 | 2016.01.12 |
申请号 | US201514919633 | 申请日期 | 2015.10.21 |
申请人 | LG Display Co., Ltd. | 发明人 | Kim Yong-Il;Kim Min-Joo |
分类号 | H01L27/12;H01L29/66 | 主分类号 | H01L27/12 |
代理机构 | Fenwick & West LLP | 代理人 | Fenwick & West LLP |
主权项 | 1. A method of manufacturing a liquid crystal display device, the method comprising: forming a gate line, a gate electrode and a gate pad on a substrate; forming a gate insulating layer on the gate line, the gate electrode and the gate pad; forming a data line, a source electrode, a drain electrode and a data pad on the gate insulating layer; forming a first passivation layer on the data line, the source electrode, the drain electrode and the data pad; forming a common layer on the first passivation layer; forming a second passivation layer on the common layer; first dry etching the second passivation layer; first wet etching the common layer exposed through the first dry-etched second passivation layer to form a common pattern; second dry etching the gate insulating layer, the first passivation layer and the second passivation layer; second wet etching the common pattern exposed through the second dry-etched second passivation layer to form a common electrode; and forming a pixel electrode and a common line on the second passivation layer. | ||
地址 | Seoul KR |