Schottky barrier diode and method for manufacturing schottky barrier diode

摘要

A Schottky barrier diode and a method of manufacturing the Schottky barrier diode are provided. The diode includes an n− type epitaxial layer disposed on a first surface of an n+ type silicon carbide substrate and having an upper surface, a lower surface, and an inclined surface that connects the upper surface and the lower surface. A p region is disposed on the inclined surface of the n− type epitaxial layer and a Schottky electrode is disposed on the upper surface of the n− type epitaxial layer and the p region. In addition, an ohmic electrode is disposed on a second surface of the n+ type silicon carbide substrate.

主权项

1. A Schottky barrier diode, comprising:
an n− type epitaxial layer disposed on a first surface of an n+ type silicon carbide substrate and having an upper surface, a lower surface, and an inclined surface that connects the upper surface and the lower surface; a p region disposed on the inclined surface of the n− type epitaxial layer; a Schottky electrode disposed on the upper surface of the n− type epitaxial layer and the p region; and an ohmic electrode disposed on a second surface of the n+ type silicon carbide substrate, wherein the n− type epitaxial layer exposes a portion of the first surface of the n+ type silicon carbide substrate, and the p region extends along the first surface of the exposed n+ type silicon carbide substrate.