Resist composition and resist pattern forming method

摘要

A resist composition includes a high-molecular weight compound having a constituent unit (a0) represented by a general formula (a0-1), an acid generator component (B) which generates an acid upon exposure, and a photodegradable base (D1) which is decomposed upon exposure to lose acid diffusion controlling properties, and a mixing ratio of the component (D1) to the component (B) is 0.5 or more in terms of a molar ratio represented by (D1)/(B). In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group.

主权项

1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid, comprising:
a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid, the base material component (A) containing a high-molecular weight compound (A1) having a constituent unit (a0) represented by the following general formula (a0-1): wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenatedalkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents and optionally substituted cyclic group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group; an acid generator component (B) which generates an acid upon exposure; and a photodegradable base (D1) which is decomposed upon exposure to lose acid diffusion controlling properties, wherein the photodegradable base (D1) is at least one compound selected from the group consisting of a compound represented by the following general formula (d1-1), a compound represented by general formula (d1-2), and a compound represented by general formula (d1-3): wherein each of Rd1 to Rd4 represents an optionally substituted cycle group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group, provided that a fluorine atom is not bonded to the carbon atom adjacent to the S atom in Rd2 in the formula (d1-2); Yd1 represents a single bond or a divalent linking group; m represents an integer of 1 or more, and each Mm+independently represent an m-valent organic cation, wherein a mixing ratio of the photodegradable base (D1) to the acid generator component (B) is 0.5 or more in terms of a molar ratio represented by (D1)/(B).