| 摘要 |
According to an embodiment of the present invention, a charged particle beam drawing device includes: a memory part memorizing drawing data about a drawing target area of a sample; a dividing part decoding the drawing data, and dividing the drawing target area into at least one first data processing area overlapped with a first area in which patterns are placed, and a second data processing area not overlapped with the first area but overlapped with a second area in which the patterns are not placed; a data processing part processing data in the first data processing area, not processing data in the second data processing area, regarding certain data processed content; and a drawing part drawing the patterns on the sample based on the processed data. |
