发明名称 SUBSTRATE PROCESSING SYSTEM, GATE VALVE, AND SUBSTRATE TRANSFER METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing system which can prevent its structure from being complicated.SOLUTION: A substrate processing system 10 comprises: five transfer modules 12 arranged in tandem; and two process modules 17 connected to each of the transfer modules 12. Each of the transfer modules 12 incorporates a transfer arm 16 for transferring a wafer W. Each of the process modules 17 performs various kinds of vacuum processing on the wafer W. At a joint part 18 between two transfer modules 12 adjacent to each other, a gate valve 23 that freely moves back and forth in a connection path 21 for making the insides of the two adjacent transfer modules 12 communicate with each other, and partitions the two adjacent transfer modules 12; and a wafer holding frame 26 that is attached to the gate valve 23 and supports the wafer W.
申请公布号 JP2016004985(A) 申请公布日期 2016.01.12
申请号 JP20140126557 申请日期 2014.06.19
申请人 TOKYO ELECTRON LTD 发明人 MAEDA KOJI;SUZUKI NAOYUKI;MIYASHITA TETSUYA;HARA MASAMICHI
分类号 H01L21/677 主分类号 H01L21/677
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