发明名称 |
SUBSTRATE PROCESSING SYSTEM, GATE VALVE, AND SUBSTRATE TRANSFER METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing system which can prevent its structure from being complicated.SOLUTION: A substrate processing system 10 comprises: five transfer modules 12 arranged in tandem; and two process modules 17 connected to each of the transfer modules 12. Each of the transfer modules 12 incorporates a transfer arm 16 for transferring a wafer W. Each of the process modules 17 performs various kinds of vacuum processing on the wafer W. At a joint part 18 between two transfer modules 12 adjacent to each other, a gate valve 23 that freely moves back and forth in a connection path 21 for making the insides of the two adjacent transfer modules 12 communicate with each other, and partitions the two adjacent transfer modules 12; and a wafer holding frame 26 that is attached to the gate valve 23 and supports the wafer W. |
申请公布号 |
JP2016004985(A) |
申请公布日期 |
2016.01.12 |
申请号 |
JP20140126557 |
申请日期 |
2014.06.19 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
MAEDA KOJI;SUZUKI NAOYUKI;MIYASHITA TETSUYA;HARA MASAMICHI |
分类号 |
H01L21/677 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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