Solar cells with patterned antireflective surfaces

摘要

Systems and methods for producing nanoscale textured low reflectivity surfaces may be utilized to fabricate solar cells. A substrate may be patterned with a resist prior to an etching process that produces a nanoscale texture on the surface of the substrate. Additionally, the substrate may be subjected to a dopant diffusion process. Prior to dopant diffusion, the substrate may be optionally subjected to liquid phase deposition to deposit a material that allows for patterned doping. The order of the nanoscale texture etching and dopant diffusion may be modified as desired to produce post-nano emitters or pre-nano emitters.

主权项

1. A method for producing a solar cell with a textured surface, the method comprising:
depositing a resist on at least one first region of a surface of a semiconductor substrate, wherein the resist is not deposited on at least one etching region of the surface; etching the surface of the semiconductor substrate, wherein the at least one etching region of the surface is textured by said etching to reduce reflectivity, and the resist prevents etching in the at least one first region; applying a diffusion barrier layer utilizing liquid phase deposition (LPD), wherein the diffusion barrier layer is applied after the etching and before applying at least one contact, and the diffusion barrier layer is deposited on the at least one first region that was not etched and self-aligned with the at least one etching region; removing the resist; doping the surface of the semiconductor substrate, wherein the doping causes the at least one etching region to have a higher resistivity than the at least one first region; and applying the at least one contact to the surface, wherein the at least one contact is deposited on the at least one first region.