发明名称 |
Source-Collector modules for EUV lithography employing a GIC mirror and a LPP source. |
摘要 |
Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules. |
申请公布号 |
NL2014253(B1) |
申请公布日期 |
2016.01.08 |
申请号 |
NL20152014253 |
申请日期 |
2015.02.06 |
申请人 |
MEDIA LARIO S.R.L. |
发明人 |
NATALE M. CEGLIO;DANIEL STEARNS;JACQUES KOOLS;GIUSEPPE VALSECCHI;RICCARDO BINDA;FABIO ZOCCHI |
分类号 |
G03F7/20;G02B5/20;G02B19/00;G02B27/42;G21K1/06;H05G2/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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