| 摘要 |
The present invention relates to a substrate processing apparatus. The substrate processing apparatus according to an embodiment of the present invention comprises: a substrate support unit which is provided with a heater therein; a gas supply unit; an exhaust baffle; and a gap bracket. The exhaust baffle and the gap bracket are made of a material used in conventional exhaust baffles and gap brackets. The material has thermal conductivity and thermal expansion lower than those of generally used aluminum (Al), and has higher resistance to heat shock, so it is possible to prevent combustion, oxidation, and warpage caused by heat from the heater. In addition, a guide ring provided on the upper face of the exhaust baffle is further included, so the gap bracket is in a correct position, and a reaction byproduct or process gas can be prevented from flowing to a gap between the gap bracket and the exhaust baffle. |
