| 发明名称 |
ENDPOINT BOOSTER SYSTEMS AND METHODS FOR OPTICAL ENDPOINT DETECTION |
| 摘要 |
An endpoint booster transports an optical signal from inside of a plasma etch chamber through a viewport to an optical cable outside of the plasma etch chamber. The optical signal is analyzed to determine an endpoint of a plasma process. The endpoint booster inhibits process byproducts from accumulating on the viewport during the plasma process, which increases the time between chamber cleanings. The reduction in chamber downtime for cleaning increases production throughput. |
| 申请公布号 |
US2016005666(A1) |
申请公布日期 |
2016.01.07 |
| 申请号 |
US201514724687 |
申请日期 |
2015.05.28 |
| 申请人 |
Skyworks Solutions, Inc. |
发明人 |
Woodard Elena Becerra;Berkoh Daniel Kwadwo Amponsah;Kimura Kelly Yuji |
| 分类号 |
H01L21/66;G01J3/443;G01J3/02;H01L21/3065 |
主分类号 |
H01L21/66 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An endpoint booster having a front side and a back side, and comprising an aperture configured to channel an endpoint signal from a vacuum etch chamber to a fiber optic cable, the back side of the endpoint booster configured to be installed next to a vacuum side of a viewport window in the vacuum etch chamber and the front side of the endpoint booster configured to be exposed to an interior of the vacuum etch chamber. |
| 地址 |
Woburn MA US |
