发明名称 METHOD FOR MEASURING RECOMBINATION LIFETIME OF SILICON SUBSTRATE
摘要 Provided is a method of measuring a recombination lifetime of a silicon substrate, which is capable of evaluating metal contamination and crystal defects in a silicon substrate manufacturing process and a device manufacturing process with high accuracy. The method includes: measuring a recombination lifetime of a silicon substrate after subjecting a surface of the silicon substrate to chemical passivation processing; and performing ultraviolet protection processing of protecting at least the silicon substrate from ultraviolet rays during a period from the chemical passivation processing to a time when the measurement of the recombination lifetime is completed.
申请公布号 US2016005664(A1) 申请公布日期 2016.01.07
申请号 US201314764856 申请日期 2013.12.27
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 Takeno Hiroshi
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
主权项 1. A method of measuring a recombination lifetime of a silicon substrate, the method comprising: measuring a recombination lifetime of a silicon substrate after subjecting a surface of the silicon substrate to chemical passivation processing; and performing ultraviolet protection processing of protecting at least the silicon substrate from ultraviolet rays during a period from the chemical passivation processing to a time when the measurement of the recombination lifetime is completed.
地址 Tokyo JP