发明名称 CRUCIBLE AND METHOD FOR PRODUCING SINGLE CRYSTAL
摘要 A crucible has a bottom and a cylindrical side surface. In the crucible, a source material is sublimated to grow a single crystal. The crucible includes a third region configured to receive a source material, a second region extending from the third region in a direction away from the bottom, and a first region extending from the second region in a direction away from the bottom. The crucible includes a first wall and a second wall inside the side surface. The first wall surrounds the first region, the second wall surrounds the second region. The crucible includes a first chamber between the first wall and the side surface and a second chamber between the second wall and the side surface. The distance between horizontal opposite portions on the first wall is constant or increases as the horizontal opposite portions approach the bottom.
申请公布号 US2016002820(A1) 申请公布日期 2016.01.07
申请号 US201514789079 申请日期 2015.07.01
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 HORI Tsutomu;UETA Shunsaku;MATSUSHIMA Akira
分类号 C30B23/06;F27B14/10;C30B29/36 主分类号 C30B23/06
代理机构 代理人
主权项 1. A crucible for sublimating a source material to grow a single crystal, comprising: a bottom; and a cylindrical side surface, wherein the crucible includes a third region configured to receive the source material a second region extending from the third region in a direction away from the bottom, and a first region extending from the second region in a direction away from the bottom, the crucible includes a first wall and a second wall inside the side surface, the first wall surrounding the first region, the second wall surrounding the second region, the crucible includes a first chamber between the first wall and the side surface and a second chamber between the second wall and the side surface, a distance between horizontal opposite portions on the first wall is constant or increases as the horizontal opposite portions approach the bottom, and a distance between horizontal opposite portions on the second wall increases as the horizontal opposite portions approach the bottom, an inclination angle α of the first wall with respect to a direction perpendicular to the bottom is smaller than an inclination angle β of the second wall with respect to a direction perpendicular to the bottom, the inclination angle α is 30 degrees or less, the inclination angle β is 70 degrees or less, and a difference between the inclination angle β and the inclination angle α is 50 degrees or less, and the first chamber includes a heat insulator, and the second chamber is empty.
地址 Osaka-shi JP