发明名称 METHOD FOR POLISHING PHOTONIC CHIPS
摘要 A method for polishing photonic chips is described. A gauge is placed in a photonic chip adjacent to an edge to be polished. The gauge includes a set of bars of various lengths. The bar lengths can be progressively ordered from shortest to longest or vice versa. The photonic chip is then secured in a chip polishing jig to get ready for polishing. When the photonic chip is being polished, an operator can visually inspect the gauge by looking at the polishing edge to estimate a polishing depth in order to determine a stopping point for polishing. Once the stopping point has been reached, the polishing of the photonic chip can be stopped.
申请公布号 US2016004011(A1) 申请公布日期 2016.01.07
申请号 US201514790963 申请日期 2015.07.02
申请人 BAE SYSTEMS INFORMATION AND ELECTRONIC SYSTEMS INTEGRATION INC. 发明人 POMERENE ANDREW TS;GREGORY MATTHEW A.
分类号 G02B6/13;B24B9/06;B24B49/02;G02B6/122 主分类号 G02B6/13
代理机构 代理人
主权项 1. A method for polishing a photonic chip edge, said method comprising: placing a gauge underneath a surface of a photonic chip, wherein said gauge is located adjacent to an edge to be polished, wherein said gauge includes a plurality of bars of various lengths; securing said photonic chip in a chip polishing jig; when said photonic chip is being polished, determining a stopping point by visually inspecting said bars of said gauge to estimate a polishing depth at which polishing should stop; and stopping polishing said photonic chip after said stopping point has been reached.
地址 NASHUA NH US