发明名称 BASE MATERIAL WITH ANTIREFLECTION FILM AND COATING LIQUID FOR FORMING ANTIREFLECTION FILM
摘要 PROBLEM TO BE SOLVED: To provide an antireflection film excellent in hardness and abrasion resistance even if a base material is resin.SOLUTION: Provided is an antireflection film-added base material including a hard coat film and an antireflection film formed on a base substrate, the hard coat film comprising surface treatment metal oxide fine particles whose mean particle size is in a range from 5 to 300 nm and a matrix component (M), the antireflection film comprising silica-based hollow fine particles (A) and a matrix component (M), (i) a content (W) of the surface treatment metal oxide fine particles being 50 to 90 wt%; (ii) a content (W) of the matrix component (M) being 10 to 50 wt%; (iii) a ratio (W)/(W) of (W) to (W) being 0.12 to 1.0; and (iv) a mean film thickness (T) is in a range from 1 to 100 μm, and (a) a content (W) of the silica-based hollow fine particles (A) being 5 to 80 wt%; (b) a content (W) of the matrix component (M) being 20 to 95 wt%; (c) a film thickness (T) of the antireflection film being 80 to 200 nm; (d) a mean particle size (Dpa) of the silica-based hollow fine particles (A) being 10 to 45 nm; and (e) (Dpa)/(T) being in a range from 0.05 to 0.56.
申请公布号 JP2016001217(A) 申请公布日期 2016.01.07
申请号 JP20140120437 申请日期 2014.06.11
申请人 JGC CATALYSTS & CHEMICALS LTD 发明人 HAKOJIMA YUKO;MATSUDA MASAYUKI;MURAGUCHI MAKOTO
分类号 G02B1/11;B32B27/18;C08K7/26;C08K9/00;C08L101/00;G02B1/10 主分类号 G02B1/11
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