发明名称 |
BASE MATERIAL WITH ANTIREFLECTION FILM AND COATING LIQUID FOR FORMING ANTIREFLECTION FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide an antireflection film excellent in hardness and abrasion resistance even if a base material is resin.SOLUTION: Provided is an antireflection film-added base material including a hard coat film and an antireflection film formed on a base substrate, the hard coat film comprising surface treatment metal oxide fine particles whose mean particle size is in a range from 5 to 300 nm and a matrix component (M), the antireflection film comprising silica-based hollow fine particles (A) and a matrix component (M), (i) a content (W) of the surface treatment metal oxide fine particles being 50 to 90 wt%; (ii) a content (W) of the matrix component (M) being 10 to 50 wt%; (iii) a ratio (W)/(W) of (W) to (W) being 0.12 to 1.0; and (iv) a mean film thickness (T) is in a range from 1 to 100 μm, and (a) a content (W) of the silica-based hollow fine particles (A) being 5 to 80 wt%; (b) a content (W) of the matrix component (M) being 20 to 95 wt%; (c) a film thickness (T) of the antireflection film being 80 to 200 nm; (d) a mean particle size (Dpa) of the silica-based hollow fine particles (A) being 10 to 45 nm; and (e) (Dpa)/(T) being in a range from 0.05 to 0.56. |
申请公布号 |
JP2016001217(A) |
申请公布日期 |
2016.01.07 |
申请号 |
JP20140120437 |
申请日期 |
2014.06.11 |
申请人 |
JGC CATALYSTS & CHEMICALS LTD |
发明人 |
HAKOJIMA YUKO;MATSUDA MASAYUKI;MURAGUCHI MAKOTO |
分类号 |
G02B1/11;B32B27/18;C08K7/26;C08K9/00;C08L101/00;G02B1/10 |
主分类号 |
G02B1/11 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|