发明名称 MICROLENS ARRAY SUBSTRATE MANUFACTURING METHOD, MICROLENS ARRAY SUBSTRATE, ELECTROOPTICAL DEVICE, AND ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a microlens array substrate manufacturing method and a microlens array substrate ensuring high productivity or cost effectiveness, an electrooptical device with the microlens array substrate, and an electronic device.SOLUTION: A microlens array substrate manufacturing method comprises: a process (steps S2 and S3) of forming a first layer outside of an area of a substrate on which the microlens is provided using a first material; a process (step S4) of forming a mask for forming the microlens on a side of the substrate on which the first layer is formed; a process (step S5) of etching the substrate via the mask and forming a recessed portion to serve as a lens surface of the microlens in the area of the substrate; a process (step S6) of removing the mask; a process (step S7) of burying the recessed portion with a second material and forming a second layer of the second material on the substrate; and a process (step S8) of polishing the second layer to expose the first layer.
申请公布号 JP2016001210(A) 申请公布日期 2016.01.07
申请号 JP20140120284 申请日期 2014.06.11
申请人 SEIKO EPSON CORP 发明人 EGUCHI YOSHIKAZU
分类号 G02B3/00;G02F1/1333;G02F1/1335 主分类号 G02B3/00
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