发明名称 |
MICROLENS ARRAY SUBSTRATE MANUFACTURING METHOD, MICROLENS ARRAY SUBSTRATE, ELECTROOPTICAL DEVICE, AND ELECTRONIC DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a microlens array substrate manufacturing method and a microlens array substrate ensuring high productivity or cost effectiveness, an electrooptical device with the microlens array substrate, and an electronic device.SOLUTION: A microlens array substrate manufacturing method comprises: a process (steps S2 and S3) of forming a first layer outside of an area of a substrate on which the microlens is provided using a first material; a process (step S4) of forming a mask for forming the microlens on a side of the substrate on which the first layer is formed; a process (step S5) of etching the substrate via the mask and forming a recessed portion to serve as a lens surface of the microlens in the area of the substrate; a process (step S6) of removing the mask; a process (step S7) of burying the recessed portion with a second material and forming a second layer of the second material on the substrate; and a process (step S8) of polishing the second layer to expose the first layer. |
申请公布号 |
JP2016001210(A) |
申请公布日期 |
2016.01.07 |
申请号 |
JP20140120284 |
申请日期 |
2014.06.11 |
申请人 |
SEIKO EPSON CORP |
发明人 |
EGUCHI YOSHIKAZU |
分类号 |
G02B3/00;G02F1/1333;G02F1/1335 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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