发明名称 METHOD FOR FORMING AN ELECTRODE STRUCTURE FOR A CAPACITIVE TOUCH SENSOR
摘要 A method of forming an electrode structure for a capacitive touch sensor in a transparent conductive layer located on a transparent non-conductive layer which is located on a colour filter layer by a direct write laser scribing process using a pulsed solid state laser, the laser wavelength, pulse length and beam profile at the substrate being selected to have a wavelength in the range 257 nm to 266 nm, a pulse length in the range 50 fs to 50 ns, and a top hat beam profile having a uniformity of power or energy density between a value (Emax) and a minimum value (Emin) of less than 10%, where uniformity is defined as (Emax−Emin)/(Emax+Emin). 1 Grooves can thus be formed in the transparent conductive layer to electrically isolate areas of the transparent conductive layer on opposite sides of each groove with substantially no damage to the transparent non-conductive layer or the colour filter layer beneath the transparent conductive layer.
申请公布号 US2016004349(A1) 申请公布日期 2016.01.07
申请号 US201414769431 申请日期 2014.02.14
申请人 M-SOLV LTD. 发明人 PRIETO RIO Camilo;CHAN Yuk Kwan
分类号 G06F3/044 主分类号 G06F3/044
代理机构 代理人
主权项 1. A method of forming an electrode structure for a capacitive touch sensor in a transparent conductive layer located on a transparent non-conductive layer which is located on a colour filter layer by a direct write laser scribing process using a pulsed solid state laser, the laser wavelength, pulse length and beam profile at the substrate being selected as follows: i) a wavelength in the range 257 nm to 266 nm ii) a pulse length in the range 50 fs to 50 ns iii) a beam profile having a near uniform power or energy density across the entire beam at the substrate, uniformity of the power or energy density between a maximum value (Emax) and a minimum value (Emin) being less than 10%, where uniformity is defined as (Emax−Emin)/(Emax+Emin),whereby grooves are formed in the transparent conductive layer to electrically isolate areas of the transparent conductive layer on opposite sides of each groove with substantially no damage to the transparent non-conductive layer or the colour filter layer beneath the transparent conductive layer.
地址 Oxford Oxfordshire GB