| 发明名称 |
SUBSTRATE FOR DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME |
| 摘要 |
A method for a display device is discussed. The method according to one embodiment includes forming a substrate of the display device; forming a thin film transistor on the substrate; and forming a passivation layer of a photosensitive organic material on the thin film transistor, the passivation layer having a contact hole exposing the thin film transistor. The photosensitive organic material comprises an ultraviolet absorber. The method according to the embodiment includes forming a blocking area in a mask above the contact hole; and absorbing, via the ultraviolet absorber, reflected ultraviolet (UV) rays passing by the blocking area in the mask above the contact hole. |
| 申请公布号 |
US2016005773(A1) |
申请公布日期 |
2016.01.07 |
| 申请号 |
US201514853731 |
申请日期 |
2015.09.14 |
| 申请人 |
LG DISPLAY CO., LTD. |
发明人 |
LEE Seung-Ryong |
| 分类号 |
H01L27/12 |
主分类号 |
H01L27/12 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for a display device, the method comprising:
forming a substrate of the display device; forming a thin film transistor on the substrate; forming a passivation layer of a photosensitive organic material on the thin film transistor, the passivation layer having a contact hole exposing the thin film transistor, wherein the photosensitive organic material comprises an ultraviolet absorber; forming a blocking area in a mask above the contact hole; and absorbing, via the ultraviolet absorber, reflected ultraviolet (UV) rays passing by the blocking area in the mask above the contact hole. |
| 地址 |
Seoul KR |
