发明名称 |
PROCESS AND SYSTEM FOR UNIFORMLY RECRYSTALLIZING AMORPHOUS SILICON SUBSTRATE BY FIBER LASER |
摘要 |
The inventive system for crystallizing an amorphous silicon (a-Si) film is configured with a quasi-continuous wave fiber laser source operative to emit a film irradiating pulsed beam. The fiber laser source is operative to emit a plurality of non-repetitive pulses incident on the a-Si. In particular, the fiber laser is operative to emit multiple discrete packets of film irradiating light at a burst repetition rate (BRR), and a plurality of pulses within each packet emitted at a pulse repetition rate (PRR) which is higher than the BRR. The pulse energy, pulse duration of each pulse and the PRR are controlled so that each packet has a desired packet temporal power profile (W/cm2) and packet energy sufficient to provide transformation of a-Si to polysilicon (p-Si) at each location of the film which is exposed to at least one packets. |
申请公布号 |
WO2016004174(A1) |
申请公布日期 |
2016.01.07 |
申请号 |
WO2015US38783 |
申请日期 |
2015.07.01 |
申请人 |
IPG PHOTONICS CORPORATION |
发明人 |
EROKHIN, YURI;SAMARTSEV, IGOR |
分类号 |
H01L21/763;H01L21/268;H01L21/822 |
主分类号 |
H01L21/763 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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