| 摘要 |
An evaporation source unit and a deposition device are disclosed. An aspect of the present invention provides an evaporation source unit arranged inside a deposition chamber to conduct deposition with regard to a substrate, the evaporation source unit comprising: a lower case having an open upper end; a heating unit of a barrel shape positioned in the lower case and configured to move up/down; a rail unit coupled to the upper end of the lower case in the transverse direction and configured to guide a straight movement; an upper case having an open lower end mounted on the rail unit such that, as the same moves along the rail unit, the same is integrated with the lower case or separated therefrom; and a crucible positioned in the upper case such that, as the heating unit moves up/down, the crucible is brought into the heating unit or taken out of the same. |
